Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit

Jörg Paulitsch; M. Schenkel; Th. Zufraß; Paul Heinz Mayrhofer; W.-D. Münz

doi:10.1016/j.tsf.2010.05.062

Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit

Jörg Paulitsch
, M. Schenkel
, Th. Zufraß
, Paul Heinz Mayrhofer
, W.-D. Münz

Chair of Physical Metallurgy (420)

Research output: Contribution to journal › Article › Research › peer-review

81 Citations (Scopus)

Translated title of the contribution	Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
Original language	English
Pages (from-to)	5558-5564
Journal	Thin solid films
Volume	518
DOIs	https://doi.org/10.1016/j.tsf.2010.05.062
Publication status	Published - 2010

Access to Document

10.1016/j.tsf.2010.05.062

Cite this

@article{9bd74c5d7b3e4551988c90b671ad4610,

title = "Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit",

author = "J{\"o}rg Paulitsch and M. Schenkel and Th. Zufra{\ss} and Mayrhofer, \{Paul Heinz\} and W.-D. M{\"u}nz",

year = "2010",

doi = "10.1016/j.tsf.2010.05.062",

language = "English",

volume = "518",

pages = "5558--5564",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit

AU - Paulitsch, Jörg

AU - Schenkel, M.

AU - Zufraß, Th.

AU - Mayrhofer, Paul Heinz

AU - Münz, W.-D.

PY - 2010

Y1 - 2010

U2 - 10.1016/j.tsf.2010.05.062

DO - 10.1016/j.tsf.2010.05.062

M3 - Article

SN - 0040-6090

VL - 518

SP - 5558

EP - 5564

JO - Thin solid films

JF - Thin solid films

ER -