Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content

J. Musil, R. Daniel, P. Zeman, O. Takai

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@article{179a4064cdf24ac681e8e22645f088ed,

title = "Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content",

author = "J. Musil and R. Daniel and P. Zeman and O. Takai",

year = "2005",

doi = "10.1016/j.tsf.2004.11.190",

language = "English",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content

AU - Musil, J.

AU - Daniel, R.

AU - Zeman, P.

AU - Takai, O.

PY - 2005

Y1 - 2005

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U2 - 10.1016/j.tsf.2004.11.190

DO - 10.1016/j.tsf.2004.11.190

M3 - Article

SN - 0040-6090

JO - Thin solid films

JF - Thin solid films

ER -