Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films

Mikko Ritala; Markku Leskelä; L. Niinistö; Thomas Prohaska; Gernot Friedbacher; Manfred Grasserbauer

doi:10.1016/0040-6090(94)90754-4

Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films

Mikko Ritala, Markku Leskelä, L. Niinistö, Thomas Prohaska, Gernot Friedbacher, Manfred Grasserbauer

Research output: Contribution to journal › Article › Research › peer-review

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Abstract

The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. The elimination of light scattering from the film surface caused a marked increase in the specular transmittance. Optical measurements, atomic force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.

Original language	English
Pages (from-to)	155-162
Number of pages	8
Journal	Thin solid films
Volume	249.1994
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(94)90754-4
Publication status	Published - 1994
Externally published	Yes

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10.1016/0040-6090(94)90754-4

Cite this

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title = "Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films",

abstract = "The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. The elimination of light scattering from the film surface caused a marked increase in the specular transmittance. Optical measurements, atomic force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.",

author = "Mikko Ritala and Markku Leskel{\"a} and L. Niinist{\"o} and Thomas Prohaska and Gernot Friedbacher and Manfred Grasserbauer",

year = "1994",

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journal = "Thin solid films",

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T1 - Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films

AU - Ritala, Mikko

AU - Leskelä, Markku

AU - Niinistö, L.

AU - Prohaska, Thomas

AU - Friedbacher, Gernot

AU - Grasserbauer, Manfred

PY - 1994

Y1 - 1994

N2 - The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. The elimination of light scattering from the film surface caused a marked increase in the specular transmittance. Optical measurements, atomic force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.

AB - The surface smoothness of TiO2 films grown by atomic layer epitaxy was improved by incorporating thin intermediate Al2O3 layers into them. The elimination of light scattering from the film surface caused a marked increase in the specular transmittance. Optical measurements, atomic force microscopy, scanning electron microscopy and X-ray diffraction were used in examining the relationships between the amount of Al2O3 added and the optical, morphological and structural properties of the films. The mechanism of the surface roughness reduction is discussed.

U2 - 10.1016/0040-6090(94)90754-4

DO - 10.1016/0040-6090(94)90754-4

M3 - Article

SN - 0040-6090

VL - 249.1994

SP - 155

EP - 162

JO - Thin solid films

JF - Thin solid films

IS - 2

ER -