The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

Fawad S. Khokar; Gregor Hlawacek; Raoul van Gastel; Harold J. W. Zandvliet; Christian Teichert; Bene Poelsema

doi:10.1016/j.susc.2011.11.012

The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

Fawad S. Khokar
, Gregor Hlawacek
, Raoul van Gastel
, Harold J. W. Zandvliet
, Christian Teichert
, Bene Poelsema

Chair of Physics (460)

Research output: Contribution to journal › Article › Research › peer-review

18 Citations (Scopus)

Translated title of the contribution	The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM
Original language	English
Pages (from-to)	475-480
Journal	Surface Science
Volume	606
DOIs	https://doi.org/10.1016/j.susc.2011.11.012
Publication status	Published - 2012

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10.1016/j.susc.2011.11.012

Cite this

@article{3a49eb7aaa68408e906b1a99251e620a,

title = "The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir\{111\} supported graphene studied by LEEM",

author = "Khokar, \{Fawad S.\} and Gregor Hlawacek and \{van Gastel\}, Raoul and Zandvliet, \{Harold J. W.\} and Christian Teichert and Bene Poelsema",

year = "2012",

doi = "10.1016/j.susc.2011.11.012",

language = "English",

volume = "606",

pages = "475--480",

journal = "Surface Science",

issn = "0043-2539",

publisher = "Brill Academic Publishers",

}

TY - JOUR

T1 - The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

AU - Khokar, Fawad S.

AU - Hlawacek, Gregor

AU - van Gastel, Raoul

AU - Zandvliet, Harold J. W.

AU - Teichert, Christian

AU - Poelsema, Bene

PY - 2012

Y1 - 2012

U2 - 10.1016/j.susc.2011.11.012

DO - 10.1016/j.susc.2011.11.012

M3 - Article

SN - 0043-2539

VL - 606

SP - 475

EP - 480

JO - Surface Science

JF - Surface Science

ER -