Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography

D. Braun; Rados Gajic; Friedemar Kuchar; Regina Korntner; E. Haugeneder; H. Löschner; J. Butschke; F. Letzkus; R. Springer

Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography

D. Braun, Rados Gajic, Friedemar Kuchar, Regina Korntner, E. Haugeneder, H. Löschner, J. Butschke, F. Letzkus, R. Springer

Chair of Physics (460)

Research output: Contribution to journal › Article › Research › peer-review

3 Citations (Scopus)

Translated title of the contribution	Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
Original language	English
Pages (from-to)	123-126
Journal	Journal of vacuum science & technology / B (JVST)
Volume	21
Publication status	Published - 2003

Cite this

@article{ce767f5d599f48bd8f9572f1cbacfe1f,

title = "Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography",

author = "D. Braun and Rados Gajic and Friedemar Kuchar and Regina Korntner and E. Haugeneder and H. L{\"o}schner and J. Butschke and F. Letzkus and R. Springer",

year = "2003",

language = "English",

volume = "21",

pages = "123--126",

journal = "Journal of vacuum science & technology / B (JVST)",

issn = "0734-211X",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography

AU - Braun, D.

AU - Gajic, Rados

AU - Kuchar, Friedemar

AU - Korntner, Regina

AU - Haugeneder, E.

AU - Löschner, H.

AU - Butschke, J.

AU - Letzkus, F.

AU - Springer, R.

PY - 2003

Y1 - 2003

M3 - Article

SN - 0734-211X

VL - 21

SP - 123

EP - 126

JO - Journal of vacuum science & technology / B (JVST)

JF - Journal of vacuum science & technology / B (JVST)

ER -