TY - JOUR
T1 - Thermal stability of MoNbTaTiW, MoNbTaVW and CrMoNbTaW thin films deposited by high power impulse magnetron sputtering
AU - Gruber, Georg
AU - Lassnig, Alice
AU - Žák, Stanislav
AU - Gammer, Christoph
AU - Cordill, Megan
AU - Franz, Robert
N1 - Publisher Copyright: © 2022 The Authors
PY - 2023/2/15
Y1 - 2023/2/15
N2 - With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin
2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.
AB - With the envisioned use as high-temperature materials, the thermal stability of three high entropy alloy thin films, based on the system MoNbTaW with additional Cr, Ti or V, was studied. All films were deposited by high power impulse magnetron sputtering and subsequently annealed in vacuum up to a temperature of 1200 °C and analyzed by X-ray diffraction. The obtained body-centered cubic structure in the as-deposited state remained stable up to the maximum annealing temperature. Measurements of the residual stress by wafer curvature and sin
2Ψ method revealed a general reduction of the stress with annealing temperature due to defect annihilation.
UR - http://www.scopus.com/inward/record.url?scp=85144826112&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2022.129189
DO - 10.1016/j.surfcoat.2022.129189
M3 - Article
SN - 0257-8972
VL - 454.2023
JO - Surface & coatings technology
JF - Surface & coatings technology
IS - 15 February
M1 - 129189
ER -