UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Thomas Höfler; B. Basnar; J. Cirac; Thomas Grießer; Gregor Hlawacek; Helmuth Hoffmann; Quan Shen; J. Kovac; Michael Ramsey; A. Satka; Christian Teichert; Susanne Temmel; Anna Track; Gregor Trimmel; Egbert Zojer; Wolfgang Kern

UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Translated title of the contribution: UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Thomas Höfler
, B. Basnar
, J. Cirac
, Thomas Grießer
, Gregor Hlawacek
, Helmuth Hoffmann
, Quan Shen
, J. Kovac
, Michael Ramsey
, A. Satka
, Christian Teichert
, Susanne Temmel
, Anna Track
, Gregor Trimmel
, Egbert Zojer
, Wolfgang Kern

Chair of Chemistry of Polymeric Materials (231)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.
Original language	German
Publication status	Published - 2007
Event	Materials Research Society Fall Meeting 2007 - Boston, United States Duration: 26 Nov 2007 → 30 Nov 2007

Conference

Conference	Materials Research Society Fall Meeting 2007
Country/Territory	United States
City	Boston
Period	26/11/07 → 30/11/07

Cite this

Höfler, T., Basnar, B., Cirac, J., Grießer, T., Hlawacek, G., Hoffmann, H., Shen, Q., Kovac, J., Ramsey, M., Satka, A., Teichert, C., Temmel, S., Track, A., Trimmel, G., Zojer, E., & Kern, W. (2007). UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.. Poster session presented at Materials Research Society Fall Meeting 2007, Boston, Massachusetts, United States.

@conference{c0c3c4b57bb840128ef18d1f3148fe7c,

title = "UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.",

author = "Thomas H{\"o}fler and B. Basnar and J. Cirac and Thomas Grie{\ss}er and Gregor Hlawacek and Helmuth Hoffmann and Quan Shen and J. Kovac and Michael Ramsey and A. Satka and Christian Teichert and Susanne Temmel and Anna Track and Gregor Trimmel and Egbert Zojer and Wolfgang Kern",

year = "2007",

language = "Deutsch",

note = "Materials Research Society Fall Meeting 2007 ; Conference date: 26-11-2007 Through 30-11-2007",

}

Höfler, T, Basnar, B, Cirac, J, Grießer, T, Hlawacek, G, Hoffmann, H, Shen, Q, Kovac, J, Ramsey, M, Satka, A, Teichert, C, Temmel, S, Track, A, Trimmel, G, Zojer, E & Kern, W 2007, 'UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.', Materials Research Society Fall Meeting 2007, Boston, United States, 26/11/07 - 30/11/07.

UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment. / Höfler, Thomas; Basnar, B.; Cirac, J. et al.
2007. Poster session presented at Materials Research Society Fall Meeting 2007, Boston, Massachusetts, United States.

Research output: Contribution to conference › Poster › Research › peer-review

TY - CONF

T1 - UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

AU - Höfler, Thomas

AU - Basnar, B.

AU - Cirac, J.

AU - Grießer, Thomas

AU - Hlawacek, Gregor

AU - Hoffmann, Helmuth

AU - Shen, Quan

AU - Kovac, J.

AU - Ramsey, Michael

AU - Satka, A.

AU - Teichert, Christian

AU - Temmel, Susanne

AU - Track, Anna

AU - Trimmel, Gregor

AU - Zojer, Egbert

AU - Kern, Wolfgang

PY - 2007

Y1 - 2007

M3 - Poster

T2 - Materials Research Society Fall Meeting 2007

Y2 - 26 November 2007 through 30 November 2007

ER -