X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via

J. Todt, H. Hammer, B. Sartory, M. Burghammer, J. Kraft, R. Daniel, J. Keckes, S. Defregger

Research output: Contribution to journal › Article › Research › peer-review

11 Citations (Scopus)

Original language	Undefined/Unknown
Pages (from-to)	182-187
Number of pages	6
Journal	Journal of applied crystallography
Volume	49
DOIs	https://doi.org/10.1107/S1600576715023419
Publication status	Published - 2016

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title = "X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via",

author = "J. Todt and H. Hammer and B. Sartory and M. Burghammer and J. Kraft and R. Daniel and J. Keckes and S. Defregger",

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T1 - X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via

AU - Todt, J.

AU - Hammer, H.

AU - Sartory, B.

AU - Burghammer, M.

AU - Kraft, J.

AU - Daniel, R.

AU - Keckes, J.

AU - Defregger, S.

N1 - cited By 1

PY - 2016

Y1 - 2016

U2 - 10.1107/S1600576715023419

DO - 10.1107/S1600576715023419

M3 - Article

SN - 0021-8898

VL - 49

SP - 182

EP - 187

JO - Journal of applied crystallography

JF - Journal of applied crystallography

ER -