Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Autoren

  • Allessandro Togni
  • Sabrina Hirn
  • Giovanni Bolelli
  • Luca Lusvarghi

Externe Organisationseinheiten

  • Department of Engineering “Enzo Ferrari”, University of Modena and Reggio Emilia, Italy

Abstract

Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.

Details

OriginalspracheEnglisch
Aufsatznummer125356
Seitenumfang8
FachzeitschriftSurface & coatings technology
Jahrgang385.2020
AusgabenummerMarch
DOIs
StatusElektronische Veröffentlichung vor Drucklegung. - 17 Jan 2020