Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure

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Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure. / Schalk, Nina; Saringer, Christian; Fian, Alexander; Terziyska, Velislava; Julin, J. ; Tkadletz, Michael.

In: Surface & coatings technology, Vol. 2021, No. 418, 2021, p. 1-7.

Research output: Contribution to journalArticleResearchpeer-review

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@article{61fb62f736074ad5a8ca0fdc6f68b2f3,
title = "Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure",
author = "Nina Schalk and Christian Saringer and Alexander Fian and Velislava Terziyska and J. Julin and Michael Tkadletz",
year = "2021",
doi = "10.1016/j.surfcoat.2021.127237",
language = "English",
volume = "2021",
pages = "1--7",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "418",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure

AU - Schalk, Nina

AU - Saringer, Christian

AU - Fian, Alexander

AU - Terziyska, Velislava

AU - Julin, J.

AU - Tkadletz, Michael

PY - 2021

Y1 - 2021

U2 - 10.1016/j.surfcoat.2021.127237

DO - 10.1016/j.surfcoat.2021.127237

M3 - Article

VL - 2021

SP - 1

EP - 7

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

IS - 418

ER -