Investigation of Si and Ge nanocluster systems on the surface SiOx/Si prepared by molecular beam epitaxy
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Investigation of Si and Ge nanocluster systems on the surface SiOx/Si prepared by molecular beam epitaxy. / Kozyrev, Yu.N.; Rubezhanska, M.Yu.; Sklyar, V. K.; Kartel, M. T.; Dmitruk, N. V.; Teichert, Christian; Hofer, Christian.
In: Dopovidi Nacional'noï Akademiï Nauk Ukraïny , 2010, p. 71-76.Research output: Contribution to journal › Article › Research › peer-review
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TY - JOUR
T1 - Investigation of Si and Ge nanocluster systems on the surface SiOx/Si prepared by molecular beam epitaxy
AU - Kozyrev, Yu.N.
AU - Rubezhanska, M.Yu.
AU - Sklyar, V. K.
AU - Kartel, M. T.
AU - Dmitruk, N. V.
AU - Teichert, Christian
AU - Hofer, Christian
PY - 2010
Y1 - 2010
M3 - Article
SP - 71
EP - 76
JO - Dopovidi Nacional'noï Akademiï Nauk Ukraïny
JF - Dopovidi Nacional'noï Akademiï Nauk Ukraïny
SN - 1025-6415
ER -