Manufacturing and Sputter Behaviour of Cold Gas Sprayed Sputter Targets
Research output: Thesis › Doctoral Thesis
Within the current thesis cold gas spraying, a novel thermal spray technique, was used for the manufacturing of sputter targets on the basis of refractory metals. With the highly flexible cold gas spraying technique, where the metallic powder particles are not getting melted or thermally softened before the impact onto the substrate, single-element as well as multi-element targets could be prepared. Furthermore, target shapes ranging from laboratory scaled planar to industrial scaled cylindrical rotatable targets could be realized. The prepared cold gas sprayed coatings are characterized by a low porosity and a homogenous particle distribution, as demonstrated for Mo-based and Nb systems. Reactive magnetron sputtering of Nb targets was performed to evaluate the sputter behaviour of cold gas sprayed Nb targets compared to commercially available sintered Nb targets. Both target variants behave equivalently and are well suited to deposit Nb-oxide films with a similar property profile. Sputtering from multi-element MoAl and MoAlTi targets demonstrated a pressure dependent variation of the chemical composition of the films with respect to the chemical composition of the targets. This could be explained by the element specific scattering behaviour of the sputtered atoms during the gas phase transport from the target to the substrate and the scattering characteristics changing from ballistic to diffusive. With the film composition adjustable by the sputter process conditions, the properties of the films could be also tuned, as demonstrated for the oxidation resistance and the electrical sheet resistivity.
|Translated title of the contribution||Herstellung und Sputterverhalten von kaltgasgespritzten Sputtertargets|
|Publication status||Published - 2018|