Photonic superlattice multilayers for EUV lithography infrastructure

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearch

Organisational units

Details

Original languageEnglish
Title of host publication34th European Mask and Lithography Conference
PublisherSPIE
Volume10775
ISBN (Print)9781510621213
DOIs
Publication statusPublished - 1 Jan 2018
Event34th European Mask and Lithography Conference, EMLC 2018 - Grenoble, France
Duration: 18 Jun 201820 Jun 2018

Conference

Conference34th European Mask and Lithography Conference, EMLC 2018
CountryFrance
CityGrenoble
Period18/06/1820/06/18